Morningstar

DNP Achieves 10nm Line Pattern Resolution on Nanoimprint Template for Cutting-Edge Semiconductors

Dai Nippon Printing Co., Ltd. (DNP, TOKYO:7912) today announced the development of a nanoimprint lithography (NIL) template featuring a circuit line width of 10 nanometers (nm: 10-9 meter). The new ...
NextBigFuture

Startup Substrate Could Enable the Age of XRay Lithography for sub-Nanometer Chips

Startup Substrate is building next-generation semiconductor fabs using advanced X-ray lithography. This goes beyond extreme ...
Morningstar

DNP Achieves Fine Pattern Resolution on EUV Lithography Photomasks for Beyond 2nm Generation

Commences sample supply of high-NA EUV photomasks for next-generation semiconductors Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required for ...
Yicai Global

China–US Team Develops Groundbreaking Etching Technique for Next-Gen Semiconductors

(Yicai) Jan. 19 -- A team of researchers from China and the United States has invented a new etching technique for ...
Nanowerk

Light can reshape atom-thin semiconductors for next-generation optical devices

Light triggers atomic shifts in asymmetric 2D semiconductors, tuning their optical response. This enables compact, energy-efficient photonic chips and sensitive sensors. (Nanowerk News) Rice ...
TechAnnouncer

Exploring the Latest Innovations in Applied Materials Machines for Semiconductor Manufacturing

Advancements in Applied Materials Machines for Enhanced Chip Performance It’s pretty wild how much chip performance has ...