In logic devices such as finFETs (field-effect transistors), metal gate parasitic capacitance can negatively impact electrical performance. One way to reduce this parasitic capacitance is to optimize ...
A new technical paper titled “Novel STI Technology for Enhancing Reliability of High-k/Metal Gate DRAM” was published by researchers at Sungkyunkwan University and Samsung Electronics. “The challenges ...
WELDERFABBER on MSN
Custom metal gate fabrication in progress
A large steel gate takes shape as clean welds lock each section into perfect alignment. This custom fabrication balances ...
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