Multiscale modelling and control of thin film deposition processes encompass advanced simulation techniques that integrate phenomena occurring over disparate spatial and temporal scales. At the ...

A pathway for ALD-enhanced materials to be quickly developed and transitioned from lab-scale to commercial production is available for almost any application, for the first time ever. Atomic-level ...

Atomic layer deposition (ALD) originated from atomic layer epitaxy, which was introduced in 1970 and initially used in electroluminescent displays. It rapidly revolutionized semiconducting ...

Jon Herlocker, co-founder and CEO of Tignis, sat down with Semiconductor Engineering to talk about how AI in advanced process control reduces equipment variability and corrects for process drift. What ...

Following the publication of the revised Foreign Exchange and Foreign Trade Act in March 2023, the Japanese government on May 23 announced to impose export restrictions on 23 items of semiconductor ...