In semiconductor manufacturing, the chemical mechanical polishing (or CMP) step is used to planarize, or create a level topography, between each layer of the interconnect structure as the device is ...

Aurora, IL, Jan. 24, 2011 (GLOBE NEWSWIRE) -- Cabot Microelectronics Corporation (Nasdaq:CCMP), the world's leading supplier of chemical mechanical planarization (CMP) polishing slurries and a growing ...

Suppliers of chemical mechanical planarization (CMP) slurries may be fierce competitors of Cabot Microelectronics, the company considered to be the sector's number one player, but they agree with the ...

Chemical Mechanical Polishing (CMP) is a key process in high-density integrated circuits production, where CMPs are utilized during various stages for normally short periods of time. Hence, CMPs need ...

SAN FRANCISCO—The price of slurries used in chemical mechanical planarization (CMP) in semiconductor manufacturing is going up thanks to a Chinese embargo of rare earth oxides, according to an analyst ...

In semiconductor manufacturing, a process called chemical mechanical planarization (CMP) is used for polishing wafer surfaces. CMP uses a slurry that contains both functional chemicals and ...

In this interview, Mark Bumiller, Technology Manager for Entegris talks to AZoM about using the Accusizer to detect large particles counts in CMP slurries. Please could you give us an introduction to ...

DUBLIN--(BUSINESS WIRE)--Research and Markets (http://www.researchandmarkets.com/research/n63tp6/cmp_consumables) has announced the addition of the "CMP Consumables ...

LONDON — Linx Consulting LLC is predicting that demand for pads and slurries will drive the annual market for chemical mechanical polishing (CMP) consumables up 12 percent to $1.23 billion in 2006, up ...

Japan-based Fuso Chemical, the global leader in semiconductor CMP slurries with a 90% market share, is set to invest JPY 50 billion (US$350 million) in a significant production expansion. Despite the ...